Unverified50% confidenceFactExact time

EUV技术使用13.5纳米波长光源，相较传统DUV(193纳米)可在单次曝光实现更精细图案转移，是7nm以下先进制程量产的关键技术

1

Sources

50%

Confidence

Long-term

Relevance

7/24/2026

First Seen

Sources

DeepSeek's In-House AI Chip: A Critical Step Toward Breaking China's NVIDIA Dependence

redditr/LocalLLaMA7/12/2026

Related Claims

UnverifiedSMIC mainly relies on deep ultraviolet (DUV) multi-patterning technology to achieve small-volume production of some 7nm process products, but its yield rates and production capacity have a significant gap compared to TSMC71% similar Unverified先进制程芯片制造高度依赖荷兰ASML生产的极紫外光刻机（EUV）68% similar

Cite This Claim

Stable URI

https://kongchang.com/claim/611123

API

curl https://kongchang.com/api/v1/knowledge/claims/611123

MCP

get_claim(id=611123)