Unverified50% confidenceFactExact time
The resolution of nanoimprint lithography is not limited by the wavelength of light, and can theoretically achieve sub-10-nanometer precision.
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Long-term
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9/22/2026
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UnverifiedCompared to DUV or EUV lithography, NIL requires no expensive optical systems, has lower equipment costs, can process large-area substrates, and can achieve sub-10-nanometer pattern resolution.74% similarUnverifiedMorphotonics's core technology is large-area nanoimprint lithography technology, which enables high-precision mass replication of micro- and nanostructures on large-format substrates.66% similarUnverified原子力显微镜（AFM）由Binnig、Quate和Gerber于1986年发明，垂直分辨率可达0.1纳米量级，横向分辨率通常在1至10纳米之间62% similar
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