Extreme Ultraviolet Lithography (EUV)

Lithography equipment that uses extreme ultraviolet light at a wavelength of 13.5 nanometers, and is the core tool for producing advanced chips at the 7nm node and below. The light source is generated from tin plasma in a vacuum environment and focused by multilayer Bragg reflectors. A single machine contains more than 100,000 precision parts, and only ASML mass-produces it worldwide.