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Concept极紫外光刻 / EUV光刻

EUV

Extreme ultraviolet lithography, a lithography technology that uses extreme ultraviolet light with a wavelength of 13.5 nm. It is the core process in chip manufacturing at advanced process nodes, and the equipment is supplied exclusively by ASML.

Timeline (last 90 days)

Oct 22

Intel's 10nm node was originally scheduled for mass production in 2016 but actually did not start manufacturing until 2018, causing TSMC to lead by about four years in EUV adoption.

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Oct 14

ASML's orders typically take 12 to 24 months from signing to revenue recognition, and EUV equipment has longer delivery cycles due to its higher complexity.

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Sep 22

Compared to DUV or EUV lithography, NIL requires no expensive optical systems, has lower equipment costs, can process large-area substrates, and can achieve sub-10-nanometer pattern resolution.

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Sep 8

EUV lithography equipment suppliers (such as the Netherlands' ASML) have limited production capacity, with lead times as long as 2 to 3 years.

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All Facts (5)

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